With continuous device scaling, process windows have become narrower and narrower due to smaller feature sizes and greater process step variability [1]. A key task during the R&D stage of ...

DNP Achieves 10nm Line pattern resolution on Nanoimprint Lithography (NIL) Template for Cutting-Edge Semiconductors.

To extend 193-nm lithography to next-generation semiconductors, Round Rock, Texas-based photomask provider Toppan Photomasks Inc. and Grenoble, France-based technology R&D organization Electronics and ...

SAN JOSE, Calif. &#151 Immersion lithography could be late to the market, forcing chip makers to consider 193-nm “dry” and double-exposure techniques for chip production at the 45-nm node and beyond, ...

SAN JOSE, Calif., Feb. 26, 2024 (GLOBE NEWSWIRE) -- Today at the SPIE Advanced Lithography + Patterning conference, Applied Materials, Inc. introduced a portfolio of products and solutions designed to ...

The chip industry is preparing for the next phase of extreme ultraviolet (EUV) lithography at 3nm and beyond, but the challenges and unknowns continue to pile up. In R&D, vendors are working on an ...